Field Ion Microscope

The Gas Field Ion Source (GFIS) technology uses a scanned beam of inert gas ions such as helium, rather than electrons typically used in scanning electron microscopes (SEM), to generate Seite 2 and pattern ultra-high resolution images and nanostructures. The beam is produced by an atomically sharp tip and results in a probe with incredibly high brightness (>5X109 A/cm2-sr at 30KeV) and extremely low energy spread (<1eV) which can be focused into an extraordinarily small spot (<0.35nm). The unique interaction dynamics of the helium ion beam with the sample enables applications in diverse fields of nanotechnology, materials and biological sciences, and nanofabrication.

ORION PLUS Helium-Ion Microscope

The Carl Zeiss ORION® PLUS Helium ion microscope is a dramatic new break-through in microscopy, delivering images with never-before seen ultra-high resolution and material contrast, with five times better depth of field. This is done using a beam of helium ions as the imaging particles that are focused into a smaller probe size and have less sample interaction than electrons resulting in higher resolution images.

Contact: Carl Zeiss NTS, LLC
Product Details: ORION PLUS Helium-Ion Microscope
Web link: ORION PLUS Helium-Ion Microscope
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