Focussed Ion Beam Dual Beam

The Focused Ion Beam (FIB) system uses a finely focused beam of gallium ions to raster over the surface of a sample. The Ga+ beam sputters sputters a small amount of surface material which leaves the surface as either secondary ions or neutral atoms. Secondary electrons are emitted. The primary beam also produces secondary electrons. Sputtered ions and secondary electrons can be used to form an image of the the sample. For TEM sample preparation, the FIB is used to mill samples surfaces and cross section materials.

CrossBeam® Workstation AURIGA® CrossBeam® Workstation AURIGA®

The unique CrossBeam® Workstation is combining the unequalled imaging power of the proprietary GEMINI® field emission technology with the sophisticated high performance focussed ion beam column into one extraordinary powerful system. The superior eucentric stage, together with a sophisticated compact multi-channel gas injection system makes the CrossBeam® Workstation to an ultimate analysis and inspection tool.

Contact: Carl Zeiss NTS, LLC
Product Details: CrossBeam® Workstation AURIGA®
Web link: Carl Zeiss NTS homepage
Request a quote or more information

Electron Microscopy Buyers Guide